Precision Analysis of Electron Beam Lithography

A Precision High - Speed Electron Beam Lithography System

A product of HP's research labs, it'llbe used in-house to make very-large-scale integrated circuits and other advanced devices. The column's field emission electron gun contributes fo fhe system's high speed. The pattern dataturns the electron beam on and off at rates as high as 300 MHz. Precision ts achieved by measuring disfortlons and correcting them with software and electronics. Digital Ad...

Dopant Driven Electron Beam Lithography

Introduction to Electron Beam Lithography

Electron Beam Lithography is a specialized technique for creating extremely fine patterns (~ 50 nm). Derived from the early scanning electron microscopes, the technique in brief consists of scanning a beam of electrons across a surface covered with a resist film sensitive to those electrons, thus depositing energy in the desired pattern in the resist film. The main attributes of the technology ...

Ice-assisted electron beam lithography of graphene.

We demonstrate that a low energy focused electron beam can locally pattern graphene coated with a thin ice layer. The irradiated ice plays a crucial role in the process by providing activated species that locally remove graphene from a silicon dioxide substrate. After patterning the graphene, the ice resist is easily removed by sublimation to leave behind a clean surface with no further process...

Computer Simulation from Electron Beam Lithography to Optical Lithography

Simulation of electron beam lithography and optical lithography has been combined to investigate the influence of a distorted photomask feature on final photoresist image. Unlike the previous optical lithography simulation which was based on ideal mask design, the combined simulation has shown that mask distortion due to electron proximity effect play an important role in worsening the optical ...